| 英文别名 |
Tetrakis(ethylmethylamino)hafnium(IV);ethyl(methyl)azanide,hafnium(4+);HAFNIUM TETRAKIS(ETHYLMETHYLAMIDE);TEMAH;TEMAH (Tetrakis(ethylmethylamino)hafnium(IV);MFCD03427130;SCHEMBL237323;Tetrakis(ethylmethylamido)hafnium(IV);352535-01-4;Tetrakis(ethylmethylamido)hafnium(IV), packaged for use in deposition systems;ethyl(methyl)azanide;hafnium(4+);Tetrakis(ethylmethylamido)hafnium(IV), >=99.99% trace metals basis;Tetrakis(ethylmethylamino)hafnium;Tetrakis(ethylmethylamino)hafnium 99.999%;Ethanamine, N-methyl-, hafnium(4+) salt (4:1);DTXSID70108284;DB-009835 |